e/Buffered oxide etch

Information
has gloss	eng: Buffered oxide etch (BOE), also known as buffered HF or BHF, is a wet etchant used in microfabrication. Its primary use is in etching thin films of silicon dioxide (SiO2) or silicon nitride (Si3N4). It is comprised of a mixture of a buffering agent, such as ammonium fluoride (NH4F), and hydrofluoric acid (HF). Concentrated HF (typically 49% water) etches silicon dioxide too quickly for good process control. Buffered oxide etch is commonly used for more controllable etching.
lexicalization	eng: Buffered Oxide Etch
instance of	c/Fluorine compounds

Meaning
French
has gloss	fra: Le buffered oxide etch (BOE - oxyde gravant tamponné) est une solution gravante utilisée en micro-fabrication. Cette solution est essentiellement utilisée pour graver des couches minces de dioxyde de silicium (SiO2) ou de nitrure de silicium (Si3N4).
lexicalization	fra: Buffered oxide etch